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Synopsys multi-core initiative to accelerate design time-to-results

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CIOL Bureau
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MOUNTAIN VIEW, USA: Synopsys Inc. announced its multi-core initiative to deploy advanced parallel, threaded and other optimized compute technologies across its Discovery Verification and Galaxy Design platforms, and Design for Manufacturing (DFM) solutions.

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The initiative aims to enable IC design companies to easily maximize the throughput of their multi-core compute infrastructure to reduce time-to-results (TTR).

This initiative builds on Synopsys' proven multi-processor and network-distributed electronic design automation (EDA) solutions, including the VCS functional verification solution with native testbench technology for compute farms and the Proteus lithography solution offering near-linear scalability. Additional multi-core-enabled solutions will be delivered throughout 2008.

The combination of increasing IC complexity and shrinking semiconductor features is driving exponential demand for design and manufacturing-related compute resources.

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Synopsys' initiative addresses this demand by deploying advanced multi-core software and optimized IT solutions that can deliver breakthrough productivity increases.

The three key components of Synopsys' multi-core initiative to be delivered during 2008 are:

Galaxy Design Platform: The industry's most widely used implementation solution, including Synopsys' Design Compiler RTL synthesis solution; IC Compiler comprehensive place-and-route solution; the PrimeTime suite for sign-off; Star-RCXT parasitic extraction; TetraMAX automatic test pattern generation (ATPG) and Hercules physical verification solutions.

Discovery Verification Platform: Synopsys' comprehensive system-to-silicon verification solution, including System Studio for algorithm design and analysis; VCS functional verification; and HSPICE, NanoSim and HSIM circuit simulation solutions.

DFM Solution: Including the Proteus OPC solution for mask synthesis; CATS mask data preparation; and Sentaurus TCAD tool suite for semiconductor process and device modeling.

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