Pall unveils filtration and purification technologies for semiconductors

WASHINGTON, USA: Pall Corp. has introduced several new filtration and purification technologies at SEMICON West in San Francisco from July 9-11 that will advance semiconductor manufacturing technology.

The new Pall products will help device and wafer manufacturers detect certain key contamination levels, and clean and maintain control of their fluids to enhance yields and improve profitability. The new technologies include:

The new Gaskleen high-bright purifier will help ensure consistent, cost-effective delivery of the pure ammonia needed to make LEDs with the highest luminosity.

Advanced 12 nm Filtration Membrane for Wet Chemical Processing - A key addition to Pall's chemical filter lineup is the new 12 nm XpressKleen filter and all PFA disposable assemblies. This filter uses an advanced molecular surface tailoring (MST) process to remain wet in critical aqueous chemicals like SC1 and SC2.

It also features an improved patent-pending PTFE membrane that easily stands up to the conditions of new, higher temperature processes. This new filter maintains critical fluid purity with guaranteed claims for ultra-low metal ion extractables (< 3 ppb), particle rinse-up and organics. Advanced manufacturing, incorporating statistical process controls, assures repeatable and reliable performance.

Gaskleen Pico1000 Analyzer for Moisture in Nitrogen - The new Gaskleen Pico1000 measures trace moisture in nitrogen process gas streams, with a limit of detection of 1 part per billion (ppb). It is ideally suited for qualifying and certifying ultra-high purity (UHP) process gas lines, as well as for detecting end-of-life when deployed downstream of our Gaskleen purifiers. The robust, compact design of the analyzer is readily portable, allowing users to easily move it around the fab for quick checks of process gas quality at many points. In addition, the Pico1000 consumes up to 70 percent less process gas, compared to competitive analyzers, and for a cost saving of 30 percent over traditional 1 ppb moisture analyzers.

Long-Life Gas Purifiers for High Brightness LED Producers - The showcased Gaskleen High-Bright purifier is a highly efficient product designed to remove molecular contaminants from ammonia used in the manufacture of high brightness, light emitting diodes (HB LEDs). Featuring twice the service life of other commercially available technologies, the new purifiers will help ensure consistent, cost-effective delivery of pure ammonia needed to make LEDs with the highest luminosity. Gaskleen purifier assemblies combine Pall's proprietary purification materials and Ultramet-L stainless steel filter media. They remove moisture and other oxygenated compounds from ammonia to sub ppb levels, while providing 3 nm or 0.4 micron filtration. Furthermore, they do not release metal ions into the process stream, further increasing luminosity.

100 nm Filtration Medium for Point-of-Use Chemical Mechanical Planarization - Pall will feature its new CMP StarKleenTM Nano filter capsule specifically designed for the classification of ceria and low solids, colloidal silica CMP slurries. The CMP StarKleen 100 nm filter performs 30 percent better in terms of defectivity reduction than its market leading predecessor for both shallow trench isolation (STI) and barrier copper processes. The product utilizes Pall's most advanced melt blown technology and is manufactured using a proprietary process that enables greater control of pore sizes and gradient. The capsule is available in multiple lengths thus allowing for usage over a wide range of flow rates.

New Xpress EZD Filter for the Latest Lithography Processes - The Xpress EZD filter represents one of the cleanest point-of-use lithography filters Pall has ever developed to specifically target defects in the semiconductor patterning process at 20 nm and below. This product comes with guaranteed low metal (< 3 ppb), particle and organic extractable levels. It is designed to significantly reduce filter start-up time and tool downtime as well as minimize chemical waste associated with finer lithography filters. The new Xpress EXD is available in Pall's quick-disconnect PhotoKleen EZD 3, EZD-3X and EZD-3XL assemblies employed on today's most advanced lithography coater systems.