Tanner EDA contributes technology to Si2’s OpenPDK coalition

AUSTIN, USA: Tanner EDA, a division of Tanner Research, Inc. has made a technology contribution to Si2's OpenPDK Coalition which allows for Open Process Specification (OPS) information to be mapped into the OpenAccess database.

Historically, EDA vendors have developed proprietary methods to store process-related information about integrated circuit designs. It has been a goal of Si2's Open Process Design Kit (OpenPDK) Coalition to produce a reference implementation based on and demonstrating the OpenPDK emerging standards.

With the Tanner EDA technology contribution, a standard means for storing process data-specifically database resolution layer, purpose, material, and display information-can be demonstrated, allowing the OPS Working Group to continue progress in bringing real-world OpenPDK use cases and examples to the industry.

"PDK engineers and developers will now have a fully documented API, reference libraries, and translators to help implement the OPS standard in their environment," says John Zuk, VP, Tanner EDA. "The API will be directly accessible from C++, Python, Ruby, Tcl, and Perl. Likewise, the translators will be able to access data in the OPS XML format while translating in and out of the OpenAccess Technology Database, namely oaTechDB."

As the Tanner EDA OpenPDK Technology Contribution has been made to the OpenPDK Coalition, all of the coalition members in good standing have access. The overarching goal of the OpenPDK Coalition is to develop a set of open standards defining a PDK structure that is portable between foundries and as agnostic to specific EDA tools as possible.

OpenPDK standards from Si2 enable greater efficiency in PDK development, verification and delivery, and will provide equivalent support to all foundries, EDA tool vendors, IP providers, and end users alike. The OpenPDK standards aim to support all process nodes, including high-voltage analog processes.