JSR Micro enters the Sematech’s RMDC league

MANHASSET: JSR Micro has become the latest member of Sematech’s Resist Materials and Development Center (RMDC) at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany.

JSR will team up with Sematech engineers on key resist issues in extreme ultraviolet (EUV) lithography. 

Jointly the researcher would be working to diminish or remove line edge roughness (LER) in lithographic images below 22 nm.

In addition, they would try to ascertain the eventual resolution of recently formulated photoresists and test different imaging materials for EUV sensitivity.

Sematech and JSR have united earlier in numerous technology development programs, which include 300 mm test wafers, low-k films, and advanced resists, including double exposure materials.

JSR Corp. is a producer in polymer chemistry and manufactures semiconductor materials and liquid crystal display materials.

Besides Sematech, the CNSE Albany NanoTech campus includes, representatives from nanotech companies IBM, AMD, GlobalFoundries, Toshiba, Applied Materials, Tokyo Electron, ASML, Novellus Systems, Vistec Lithography and Atotech.