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Entegris launches ultra clean filter for semiconductor manufacturing

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Harmeet
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USA: Entegris Inc. announced the latest addition to its Torrento family of ultra clean liquid filtration solutions used in the semiconductor manufacturing process.

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The Torrento X Series is the first commercial nondewetting all PTFE filter with 10 nm particle retention for advanced wet etch and clean applications.

"As the industry ramps to sub-2X nm manufacturing processes, enhanced cleanliness requirements have become a necessity to reduce particle defectivity and minimize metal contaminants that impact wafer yields," said Todd Edlund, senior VP and GM of Entegris' Critical Materials Handling Business. "Our new Torrento filter can enable integrated device manufactures to efficiently scale-up and produce more advanced devices."

Torrento X series filters facilitate 'drop-in replacement' of new or existing filters, enabling greater installation flexibility and reducing overall operational costs. The field-proven high-flux membrane filter comes standard with ultra-low metallic cleanliness technology (UCM) to minimize the most challenging contaminants in advanced semiconductor fabs.

Entegris also offers an Extreme-Ultra Clean Membrane (X-UCM) option with a higher level of cleanliness compared to any prior generation of PTFE filters with faster start up times and superior retention ratings.

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