MILPITAS, USA: Nanometrics Inc., a leading supplier of advanced process control metrology systems used primarily in the manufacturing of semiconductors, solar photovoltaics and high-brightness LEDs, announced the shipment of a Lynx cluster metrology system.

The system was delivered as a follow-on order to a leading memory manufacturer as part of its plan for high-volume manufacturing of its latest DRAM and Flash memory technologies.

"This customer had originally ordered this Lynx system on an expedited basis in 2008, but subsequently canceled the purchase in response to the deteriorating market environment at the end of last year. The recent re-issue of the purchase order and request for immediate insertion into a high-volume production line is evidence of the importance of our technology to support the ramp of this customer's next-generation memory devices," commented Tim Stultz, president and chief executive officer.

Nanometrics' Lynx platform enables its customers to leverage numerous process control technologies for monitoring steps throughout the manufacturing process. This Lynx system was equipped with 9010 metrology to support Optical Critical Dimension (OCD) metrology for control of critical lithography steps and supports Nanometrics' 9010 integrated metrology systems.

The Lynx offers future extendibility and productivity improvements at a low cost of ownership, as it enables integration with additional Nanometrics Thin Film, OCD, and Overlay metrology solutions for advanced semiconductor manufacturing process control.